| Thickness | Doping level | Resistivity | |
| μm | ppm | at.cm-3 | mΩ.cm |
| 2-3 | 100 | 2.1019 | 500 |
| 2-3 | 700 | 1.1020 | 100 |
| 2-3 | 2500 | 4.1020 | 14 |
| 2-3 | 5000 | 9.1020 | 4 |
| 2-3 | 10000 | 2.1021 | 2 |
| p-Silicon | Thickness (mm) | Size (mm) | Coated side | Available doping level (ppm) |
| Monocrystalline | 2 | Rectangle, 50 x 25 | Monopolar (one) | 700, 2500, 5000, 10000 |
| Monocrystalline | 2 | Rectangle, 50 x 25 | Bipolar (two) | 700 |
| Monocrystalline | 2 | Disc, Φ100 | Monopolar (one) | 100, 700, 2500, 5000, 10000 |
| Monocrystalline | 2 | Disc, Φ100 | Bipolar (two) | 700 |
| Monocrystalline | 1 | Square, 100 x 100 | Monopolar (one) | 100, 700, 2500, 5000, 10000 |
| Monocrystalline | 1 | Square, 100 x 100 | Bipolar (two) | 700 |
For other specifications please visit the Custom NeoCoat-Electrodes section.
NeoCoat is able to offer a wide variety of custom electrodes:
| Substrate | Mono- or polycristalline silicon (10-3 - 104 Ω.cm) |
| Electrode Shape | Disc, square, rectangular tailored shapes |
| External Size | Discs (3 to 300 mm), squares (3x3 to 100x100 mm) |
| BDD Thickness | From less than 100 nm up to more than 25 μm |
| Boron concentration | 100-10’000 ppm |
| BDD resistivity (mΩ.cm) | 2 - 10’000 |
| Thickness uniformity (3σ) | ±5% (within 100 mm) |
| Grain size | 40 nm at 100 nm film thickness |
| 0.5 µm at 3µm film thickness | |
| DCOI (Diamond Coating On Insulator) | Diamond coating is also available on some insulating material such as Si3N4/SiO2 |
| Specific treatment | Backside metallization with gold available on request |