CVDiam® HFCVD reactors
NeoCoat’s full range of CVDiam® HFCVD reactors fulfills all specific needs of customers with several deposition capacities for lab-scale applications, mass production, industrial applications or R&D projects.
From your needs to final installation, we build a specific project with you and offer a complete and professional solution:
- HFCVD equipment with custom substrate holder
- Detailed and documented processes
- Installation in your facilities
- Training
- Technical support (maintenance and process)
Specifications
| CVDiam | HF 60 | HF 120 |
| Layout (mm) H x L x W | 2000 x 2200 x 1500 | 2000 x 3700 x 1500 |
| Maximum Process Power (KW) | 60 | 120 |
| Deposition surface (mm) W x L | 400 x 540 | 400 x 1140 |
- HF60 is particularly suitable for tool applications thank to its large front door facilitating substrate holder loading
- HF120 has been designed for large substrates
Our CVDiam® HF reactor can be used with tantalum or tungsten wires as a function of your applications
Reactors with NeoCoat®-Process (pretreatment and coating) can be used to produce diamond films with many different specifications: NCD (nanocrystalline) – MCD (microcrystalline) – various thicknesses
Main components
Our hot filament CVDiam® reactors are composed of high quality components from major vacuum suppliers or design/machine in Swiss workshops:
- Horizontal filament holder, tensioning system,
- DC power supply,
- Stainless steel double-wall reactor,
- Gas panel (H2, CH4, N2, others),
- Pumping system and fine pressure tuning,
- Machine control PLC,
- Touch screen display + Industrial PC (Windows 11),
- Graphical User Interface (GUI),
- Cooling loop with independent heat-exchanger,