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CVDiam® HFCVD reactors

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NeoCoat’s full range of CVDiam® HFCVD reactors fulfills all specific needs of customers with several deposition capacities for lab-scale applications, mass production, industrial applications or R&D projects.

From your needs to final installation, we build a specific project with you and offer a complete and professional solution:

  • HFCVD equipment with custom substrate holder
  • Detailed and documented processes
  • Installation in your facilities
  • Training
  • Technical support (maintenance and process)

 

Specifications

CVDiam HF 60 HF 120
Layout (mm) H x L x W 2000 x 2200 x 1500 2000 x 3700 x 1500
Maximum Process Power (KW) 60 120
Deposition surface (mm) W x L 400 x 580 400 x 1180
Capacity / batch (6mm endmills) 800 N/A

 

  • HF60 is particularly suitable for tool applications thank to its large front door facilitating substrate holder loading
  • HF120 has been designed for large substrates

 

Our CVDiam® HF reactor can be used with tantalum or tungsten wires as a function of your applications

Reactors with NeoCoat®-Process (pretreatment and coating) can be used to produce diamond films with many different specifications: NCD (nanocrystalline) – MCD (microcrystalline) – various thicknesses

 

Main components

Our hot filament CVDiam® reactors are composed of high quality components from major vacuum suppliers or design/machine in Swiss workshops:

  • Horizontal filament holder, tensioning system,
  • DC power supply,
  • Stainless steel double-wall reactor,
  • Gas panel (H2, CH4, N2, others),
  • Pumping system and fine pressure tuning,
  • Machine control PLC,
  • Touch screen display + Industrial PC (Windows 10),
  • Graphical User Interface (GUI),
  • Cooling loop with independent heat-exchanger,
NeoCoat SA  -  Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds, Switzerland  -  +41 32 930 29 40                       © 2012 - 2021       Legal disclaimer