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neoDiam®-Coatings
Main data
NeoCoat custom HFCVD reactors have the following specifications:
- Diamond film deposition on surfaces up to 0.5 m²,
- Production capacity that allows the coating of a large number of parts (up to several thousand per week depending on part size).
Thanks to its proprietary specific nanoseeding pretreatment, NeoCoat can provide:
- Very thin Diamond film on surface-complex shapes such as patterned wafers, microsystems or bearings
- Microcrystalline diamond films with high sp3 carbon purity (>99.5%) and small grain size that induce low roughness and properties close to those of bulk diamond.
- Nanocrystalline diamond films with very smooth surfaces for mechanical or MEMS applications
- Properties of different diamond films are summarized in our flyer (please download).
| Substrate | p-Si, n-Si, SiC, Si3N4, refractory metals, cemented carbide, oxydes (alumina, silica) |
| Substrate size | Up to 400 mm |
| Substrate shape | 3D structured, patterned, flat... |
| Film thickness | 100 nm to 50 µm |
| Film structure | Microcrystalline or nanocrystalline |
| Film roughness | Microcrystalline: 0.1µm for 3µm thick film, optional polishing to decrease down to 2nm |
| Nanocrystalline: < 30nm (independent from film thickness) | |
| Boron concentration | 100-10000 ppm |
| Uniformity within 100 mm (3σ) | ±5 % |
Main applications
- Thermal management
- Conditionning pads
- Diamond on silicon wafers
- Improving lifetime of rotary seals
- Protective coating on transparent substrates