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neoDiam®-Coatings

1_AFM_tip2_100 nm diamond layer6_Diamond coated seals7_diamond_coated_drill

Main data

NeoCoat custom HFCVD reactors have the following specifications:

  • Diamond film deposition on surfaces up to 0.5 m²,
  • Production capacity that allows the coating of a large number of parts (up to several thousand per week depending on part size).

Thanks to its proprietary specific nanoseeding pretreatment, NeoCoat can provide:

  • Very thin Diamond film on surface-complex shapes such as patterned wafers, microsystems or bearings
  • Microcrystalline diamond films with high sp3 carbon purity (>99.5%) and small grain size that induce low roughness and properties close to those of bulk diamond.
  • Nanocrystalline diamond films with very smooth surfaces for mechanical or MEMS applications
  • Properties of different diamond films are summarized in our flyer (please download).

Substrate p-Si, n-Si, SiC, Si3N4, refractory metals,
cemented carbide, oxydes (alumina, silica)
Substrate size Up to 400 mm
Substrate shape 3D structured, patterned, flat...
Film thickness 100 nm to 50 µm
Film structure Microcrystalline or nanocrystalline
Film roughness Microcrystalline: 0.1µm for 3µm thick film,
optional polishing to decrease down to 2nm
Nanocrystalline: < 30nm (independent from film thickness)
Boron concentration 100-10000 ppm
Uniformity within 100 mm (3σ) ±5 %

 

Main applications

  • Thermal management
  • Conditionning pads
  • Diamond on silicon wafers
  • Improving lifetime of rotary seals
  • Protective coating on transparent substrates
NeoCoat SA  -  Eplatures-Grise 17, CH-2300 La Chaux-de-Fonds, Suisse  -  +41 32 930 29 40           © 2012-2021     Mentions Légales